Improved electrochemical performance of trivalent-chrome coating on Al 6063 alloy via urea and thiourea addition |
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Authors: | Huicheng Yu Baizhen Chen Xiliang Sun |
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Affiliation: | a School of Metallurgical Science and Engineering, Central South University, Yuelu District, Changsha 410083, China b Guangzhou Non-Ferrous Metal Research Institute, Guangzhou 510651, China c Center of Modern Testing and Analysis, Central South University, Yuelu District, Changsha 410083, China |
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Abstract: | This project aims at improving the electrochemical performance of trivalent-chrome coating through urea and thiourea addition. The electrochemical behaviors of coatings formed with different concentrations of urea and thiourea were investigated in 3.5 wt.% NaCl solution at 25 °C, using potentiodynamic polarization curves and EIS. The corrosion resistance of coatings is improved greatly by adding a small amount of inhibitors, whereas the excessive addition deteriorates the corrosion resistance. Thiourea addition presents better effect than urea. To explain the EIS results of the coatings, a simple equivalent circuit was designed. The EIS parameters were obtained by fitting the EIS plots. The results of the polarization curves and EIS show that the inhibitor-containing coatings present better corrosion resistance than the coating without inhibitor. The morphology and composition and valence state of the conversion coatings were examined by SEM and EDS and XPS, respectively. The results indicated that the trivalent chromium coating was developed on Al 6063 alloy, urea and thiourea inhibitors were also deposited on the substrates, respectively. A noticeable chemical shift was also observed. |
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Keywords: | Thin films Al alloys Trivalent chromium Inhibitor Corrosion resistance |
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