30-GHz Low-Noise Performance of 100-nm-Gate-Recessed n-GaN/AlGaN/GaN HEMTs |
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Authors: | Chang C-T Hsu H-T Chang E Y Kuo C-I Huang J-C Lu C-Y Miyamoto Y |
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Affiliation: | Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu , Taiwan; |
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Abstract: | We demonstrate a 100-nm-gate-recessed n-GaN/AlGaN/GaN high-electron mobility transistor (HEMT) with low-noise properties at 30 GHz. The recessed GaN HEMT exhibits a low ohmic-contact resistance of 0.28 $Omega cdot hbox{mm}$ and a low gate leakage current of 0.9 $muhbox{A/mm}$ when biased at $V_{rm GS} = -hbox{3} hbox{V}$ and $V_{rm DS} = hbox{10} hbox{V}$. At the same bias point, a minimum noise figure of 1.6 dB at 30 GHz and an associated gain of 5 dB were achieved. To the best of our knowledge, this is the best noise performance reported at 30 GHz for gate-recessed AlGaN/GaN HEMTs. |
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