| 相图--解释金属化层稳定性和薄膜反应的热力学方法 |
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| 引用本文： | 岳瑞峰,王燕. 相图--解释金属化层稳定性和薄膜反应的热力学方法[J]. 半导体技术, 2000, 25(2): 10-13 |
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| 作者姓名： | 岳瑞峰 王燕 |
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| 作者单位： | 1. 清华大学微电子学研究所,北京,100084
2. 西安理工大学电子工程系,西安,710048 |
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| 摘 要： | 介绍了计算相图的起因与发展 ,综述了利用 Gibbs生成自由能数据绘制简化的三元、四元相图的热力学方法 ,尤其是确定相图中直达连线的思想方法 ,最后给出了利用相图来解释金属化层稳定性和薄膜反应的应用实例。
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| 关 键 词： | 相图 金属化层 稳定性 薄膜反应 热力学 |
Phase Diagram-a Thermodynamic Method of Explaining Metallization Layer Stability and Thin Film Reactions |
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| Yue Ruifeng,Wang Yan. Phase Diagram-a Thermodynamic Method of Explaining Metallization Layer Stability and Thin Film Reactions[J]. Semiconductor Technology, 2000, 25(2): 10-13 |
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| Authors: | Yue Ruifeng Wang Yan |
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| Abstract: | The origin and development of calculated phase diagrams are introduced,and a thermodynamic method of constructing simplified ternary and quaternary phase diagrams using known data for Gibbs free energy of formation,especially the determination method of stable tie lines in a phase diagram is reviewed.In the end,examples of interpreting metallization layer stability and thin film reactions by phase diagrams are given. |
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| Keywords: | Phase diagram Metallization layer stability Thin film reaction Thermo dynamic approach |
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