| 脉冲激光沉积制备铁电薄膜材料研究进展 |
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| 引用本文： | 符春林,潘复生,蔡苇,邓小玲.脉冲激光沉积制备铁电薄膜材料研究进展[J].四川激光,2008,29(4). |
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| 作者姓名： | 符春林 潘复生 蔡苇 邓小玲 |
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| 作者单位： | 重庆科技学院冶金与材料工程学院，重庆大学材料科学与工程学院 |
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| 基金项目： | 重庆市自然科学基金，重庆市教委资助项目 |
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| 摘 要： | 铁电薄膜是一类重要的功能材料,是近年来高新技术研究的前沿和热点之一。脉冲激光沉积(PLD)是制备铁电薄膜的一种重要方法。综述了脉冲激光沉积制备铁电薄膜的历史、工艺参数、特点和采用此方法制备出的某些材料的铁电性能。
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| 关 键 词： | 薄膜 脉冲激光沉积 铁电 制备 |
Latest progress on preparation of ferroelectric thin films by pulsed laser deposition |
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| FU Chun-lin,PAN Fu-sheng,CAI Wei,DENG Xiao-ling.Latest progress on preparation of ferroelectric thin films by pulsed laser deposition[J].Laser Journal,2008,29(4). |
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| Authors: | FU Chun-lin PAN Fu-sheng CAI Wei DENG Xiao-ling |
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| Abstract: | Ferroelectric films,as an important functional material,has become an extensively studied subject of much basic and technological interest.Pulsed laser deposition is an important method for preparation of ferroelectric films.Not only the history,technology parameters and peculiarities but also ferroelectric properties of some materials by pulsed laser deposition are reviewed. |
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| Keywords: | film pulsed laser deposition ferroelectric preparation |
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