Inductively coupled plasma assisted physical vapor deposition of titanium nitride coatings

Beneficial effects of increased low energy ion bombardment during physical vapor deposition of ceramic thin films and coatings have been amply documented recently. We have constructed a small laboratory scale high density inductively coupled plasma (ICP) assisted magnetron sputtering system. Such a system offers higher plasma densities as compared to conventional magnetron sputtering. We describe the synthesis of titanium nitride coatings at relatively low temperatures by ICP assisted reactive magnetron sputter deposition.