首页 | 本学科首页   官方微博 | 高级检索  
     

OLEDs中CuPc缓冲层作用的AFM与XPS研究
引用本文:欧谷平,宋珍,桂文明,齐丙丽,王方聪,张福甲. OLEDs中CuPc缓冲层作用的AFM与XPS研究[J]. 功能材料与器件学报, 2006, 12(2): 120-124
作者姓名:欧谷平  宋珍  桂文明  齐丙丽  王方聪  张福甲
作者单位:兰州大学物理系,兰州,730000;北京机械工业学院基础部,北京,100085
基金项目:中国科学院资助项目 , 引进国际先进农业科技计划(948计划)
摘    要:利用AFM对CuPc/ITO样品表面进行扫描,发现其生长较均匀,基本上覆盖了ITO表面的缺陷,且针孔较少.通过样品表面和界面的XPS谱图分析,进一步证实了这一结果,同时发现,CuPc可以抑制ITO中的化学组分向空穴传输层的扩散.有利于器件的性能的改善和寿命的提高.

关 键 词:缓冲层CuPc  原子力显微镜(AFM)  X射线光电子能谱(XPS)
文章编号:1007-4252(2006)02-0120-05
收稿时间:2005-04-25
修稿时间:2005-09-28

Function of CuPc buffer layer in OLEDs by AFM and XPS analysis
OU Gu-ping,SONG Zhen,GUI Wen-ming,QI Bing-li,WANG Fang-cong,ZHANG Fu-jia. Function of CuPc buffer layer in OLEDs by AFM and XPS analysis[J]. Journal of Functional Materials and Devices, 2006, 12(2): 120-124
Authors:OU Gu-ping  SONG Zhen  GUI Wen-ming  QI Bing-li  WANG Fang-cong  ZHANG Fu-jia
Affiliation:1. School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China; 2. Foundation Department of Machine and Industry College, Beijing 100085, China
Abstract:The morphology of CuPc/ITO sample was investigated using Atomic Force Microscopy(AFM).It is found that CuPc molecules cover the surface defects of ITO and form a uniform film with few pores.The fact is further testified by XPS investigation on the surface and interface of the sample.And it also shows that CuPc film can prevent chemical constituent in ITO diffusing into hole transport layer.The property and life time of OLED devices are improved.
Keywords:buffer layer CuPc    AFM    XPS
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号