基于规则的光学邻近矫正中规则的相关处理

讨论了如何选择适当的规则,如何建立简洁实用的规则库,如何应用规则库.提出了四种主要的光学邻近矫正规则,在实验结果中列举了规则库中的部分数据.利用规则矫正后的版图光刻得到的硅片图形有了明显的改善.规则库的自动建立部分 (OPCL)是基于规则的光学邻近矫正系统的重要组成部分.

Important Works About Rules in Rules-Based Optical Proximity Correction

Considering the efficiency and veracity of rules- based optical proximity correction (OPC),the importance of rules in rules-based OPC is pointed out.And how to select,to construct and to apply more concise and practical rules-base is disscussed.Based on those ideas,four primary rules are suggested.Some data resulted in rules-base are shown in table.The patterns on wafer are clearly improved by applying these rules to correct mask.OPCL,the auto matic construction of the rules-base is an important part of the whole rules-b ased OPC system.