工艺参数对Ni-SiC纳米复合镀层沉积速率的影响

用电沉积的方法在铜表面制备了Ni-SiC纳米复合镀层，研究了不同的工艺参数，包括阴极电流密度、镀液中纳米SiC悬浮量、镀液pH值、镀液温度和搅拌速度对复合镀层的沉积速率的影响。结果表明：在实验电流范围内，镀层的沉积速率随着阴极电流密度的增大呈线性上升的趋势；随着镀液中纳米颗粒悬浮量、镀液pH值及搅拌速度的增大而增大，当达到一定值时，又开始下降；随着镀液温度升高，逐步降低。最佳参数为：不烧焦镀层前提下的最大电流，纳米颗粒体积质量为5g／L，pH值3．5—4．0，温度30℃，搅拌速度为中高速。

Influences of technological parameters on deposition rate of Ni-SiC nano-composite

The Ni-SiC nano-composite coating is prepared with electrodeposition method, the influences of ca- thodic current density , SiC concentration in electrolyte, pH value, bath temperature and stirring speed on the deposition rate are researched. The results show that in the current range, the deposition rate of coating is lin- ear trend of rise with the increasing of cathodic current density ; the deposition rate of coating increases with the increasing of SiC concentration in electrolyte, pH value and stirring speed, if it reaches to a certain value, the deposition rate will be decreased, and the deposition rate of coating decreases to a certain extent with the increasing of bath temperature. The best parameters are ： the volume mass of nano-particles is 5 g/L, pH val- ue is 3.5 -4. 0, the temperature is 30 ℃ , and the stirring speed is medium and high speed.