| Influence of Experimental Parameters on Reactive Magnetron Sputtering CN_x Thin Films |
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| 收稿时间： | 1997-03-28 |
Influence of Experimental Parameters on Reactive Magnetron Sputtering CN_x Thin Films |
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| Weitao ZHENG,Tao DING I.Ivanov,J.-E Sundgren. Influence of Experimental Parameters on Reactive Magnetron Sputtering CN_x Thin Films[J]. Journal of Materials Science & Technology, 1997, 13(2): 154-156 |
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| Authors: | Weitao ZHENG Tao DING I.Ivanov J.-E Sundgren |
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| Affiliation: | Weitao ZHENG,Tao DING (Dept. of Materials Science,Jilin University,Changchun,China)I.Ivanov,J.-E Sundgren (Dept. of Physics,Linkoping University,S- Linkoping,Sweden) |
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| Abstract: | Carbon nitride thin films were deposited on Si(001) using unbalanced magnetron sputtering at different experimental parameters. The effects of nitrogen partial pressure, substrate temperature and substrate bias on the deposition rate and nitrogen content are discussed. |
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