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掺Nd纳米ZnO薄膜特性研究
引用本文:李健,赛喜雅勒图,郝丽娟. 掺Nd纳米ZnO薄膜特性研究[J]. 真空科学与技术学报, 2003, 23(3): 212-215
作者姓名:李健  赛喜雅勒图  郝丽娟
作者单位:内蒙古大学物理系,呼和浩特,010021
基金项目:内蒙古自然科学基金资助项目 (2 0 0 2 0 80 2 0 2 0 9)
摘    要:研究了用真空蒸发法在玻璃衬底上制备稀土掺杂纳米ZnO薄膜结构、导电性及光透射性能。结果显示 ,在 5 0 0℃氧化、热处理稀土元素Nd掺杂后能够明显改善纳米ZnO薄膜的结构特性 ,薄膜的晶粒尺寸随掺杂含量的增加而减小。掺Nd使ZnO薄膜的电性能有所改善但使纳米ZnO薄膜的光透射性有所降低。

关 键 词:真空蒸发  纳米ZnO薄膜  掺杂
文章编号:0253-9748(2003)03-0212-04
修稿时间:2003-01-12

Studies of Characteristics of Nd-Doped ZnO Nanometer Films
Li Jian ,Saixi Yaletu,Hao Lijuan. Studies of Characteristics of Nd-Doped ZnO Nanometer Films[J]. JOurnal of Vacuum Science and Technology, 2003, 23(3): 212-215
Authors:Li Jian   Saixi Yaletu  Hao Lijuan
Affiliation:Li Jian *,Saixi Yaletu,Hao Lijuan
Abstract:The micro structures and properties of Nd doped ZnO films,grown on glass substrates by vacuum deposition,have been studied with X ray diffraction (XRD) spectroscopy.The results show that Nd doping strongly affects the microstructures of the films and the mean grain size of the films drastically reduces with the increase of Nd concentration.We found that Nd doping improves its electrical properties but reduces its optical transmission.
Keywords:Vacuum deposition  Nano ZnO films  Doping
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