| 一种新型的负型激光光致抗蚀剂 |
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| 引用本文： | 金桂林,金晓英,潘孝仁,金乾元,陈卫红. 一种新型的负型激光光致抗蚀剂[J]. 应用激光, 1993, 0(1) |
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| 作者姓名： | 金桂林 金晓英 潘孝仁 金乾元 陈卫红 |
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| 作者单位： | 华东化工学院物理系 200237 |
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| 摘 要： | 用氮分子激光诱导聚甲基丙烯酸甲酯(PMMA)与4,4′-二迭氮二苯基砜(4,4′-DDS)的交联聚合反应,使PMMA由正型转变为负型抗蚀剂。用付立叶变换红外光谱法研究其反应动力学,研究了交联剂4,4′-DDS、敏化剂4-笨氧基二笨甲酮以及防氧剂对一二甲胺苯甲醛对于反应速率、量子产率、转化率以及反应诱导期的影响。
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| 关 键 词： | 激光蚀剂 光致抗蚀剂 |
A new negative laser-photoresist |
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| Jin Guilin,Jin Xiaoying,Pan Xiaoren,Jin Qianyuan,Chen Weihong East China Inst. Chem.Technol. A new negative laser-photoresist[J]. Applied Laser, 1993, 0(1) |
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| Authors: | Jin Guilin Jin Xiaoying Pan Xiaoren Jin Qianyuan Chen Weihong East China Inst. Chem.Technol |
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| Affiliation: | Jin Guilin;Jin Xiaoying;Pan Xiaoren;Jin Qianyuan;Chen Weihong East China Inst. Chem.Technol |
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| Abstract: | The crosslinking reaction of polymethyl methacrylate (PMMA) and 4,4'-diazide diphenylsufone(4,4'-DDS) is induced by N_2laser, so PMMA is reversed from positive photoresist to negative one. The reaction kine-tics is investigatedwith FTIR spectroscopy. The influcces of the crosslinking agent 4,4'-DDS, the sensitizer4-phenoxy benzophenone and the anti-oxidant p-dimethyl aminobenzaldchyde on the reaction rate, the quantumyield, the conversion ratio and the induction period are investigated. |
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| Keywords: | Laser photoresist |
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