Diamond FET using high-quality polycrystalline diamond with f/sub T/ of 45 GHz and f/sub max/ of 120 GHz |
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Authors: | Ueda K Kasu M Yamauchi Y Makimoto T Schwitters M Twitchen DJ Scarsbrook GA Coe SE |
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Affiliation: | NTT Basic Res. Labs., Atsugi, Japan; |
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Abstract: | Using high-quality polycrystalline chemical-vapor-deposited diamond films with large grains (/spl sim/100 /spl mu/m), field effect transistors (FETs) with gate lengths of 0.1 /spl mu/m were fabricated. From the RF characteristics, the maximum transition frequency f/sub T/ and the maximum frequency of oscillation f/sub max/ were /spl sim/ 45 and /spl sim/ 120 GHz, respectively. The f/sub T/ and f/sub max/ values are much higher than the highest values for single-crystalline diamond FETs. The dc characteristics of the FET showed a drain-current density I/sub DS/ of 550 mA/mm at gate-source voltage V/sub GS/ of -3.5 V and a maximum transconductance g/sub m/ of 143 mS/mm at drain voltage V/sub DS/ of -8 V. These results indicate that the high-quality polycrystalline diamond film, whose maximum size is 4 in at present, is a most promising substrate for diamond electronic devices. |
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