| 电子束蒸发法制备六硼化镧薄膜及其特性研究 |
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| 引用本文： | 时晴暄, 林祖伦, 李建军, 陈泽祥,.电子束蒸发法制备六硼化镧薄膜及其特性研究[J].电子器件,2007,30(3):745-747. |
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| 作者姓名： | 时晴暄 林祖伦 李建军 陈泽祥 |
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| 作者单位： | 电子科技大学光电信息学院,四川,610054 |
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| 摘 要： | 用电子束蒸发的方法在Ta衬底上制备了LaB6薄膜,用电子显微镜、X射线光电子能谱仪对样品的表面状况、化学组分进行了分析.采用真空热电子发射法测出了LaB6薄膜的逸出功.结果表明,电子束蒸发的方法能够得到化学成分偏差较小、表面状况较好的LaB6薄膜,其逸出功为2.59eV,具有良好的电子发射性能.
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| 关 键 词： | LaB6薄膜 电子束蒸发 真空热电子发射法 逸出功 |
| 文章编号： | 1005-9490（2007）03-0745-03 |
| 修稿时间： | 2006-06-13 |
LaB6 Thin Films Prepared by Electron Beam Evaporation and Its Property |
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| SHI Qing-xuan,LIN Zu-lun,LI Jian-jun,CHEN Ze-xiang.LaB6 Thin Films Prepared by Electron Beam Evaporation and Its Property[J].Journal of Electron Devices,2007,30(3):745-747. |
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| Authors: | SHI Qing-xuan LIN Zu-lun LI Jian-jun CHEN Ze-xiang |
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| Affiliation: | School of Optic-Electronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China |
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| Abstract: | LaB6 thin films were deposited on Ta substrates by electron beam evaporation technique. The surface morphology and composition of the films were characterized by scanning electron microscope and X-ray photoelectron spectrometer. The work functions of the films were measured by thermal electron beam method. The results indicated that the films prepared by the electron beam evaporation method had little nonstoichiometric mixture of atoms and good surface status. The measurement of the work function is 2. 59 eV, and it shows an excellent emission character. |
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| Keywords: | LaB6 thin films electron beam evaporation thermal electron beam method work function |
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