Metal nanowire grating patterns |
| |
Authors: | Kulkarni G U Radha B |
| |
Affiliation: | Chemistry and Physics of Materials Unit and DST Unit on Nanoscience,Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur PO, Bangalore 560064, India. kulkarni@jncasr.ac.in |
| |
Abstract: | Metal nanowire patterning in the form of grating structures has been carried out using a wide range of lithography techniques, and many hybrid methods derived from them. The challenge is to achieve sub-100 nm linewidths with controllable spacing and thickness over large areas of substrates with high throughput. In particular, the patterns with linewidth and spacing of a few tens of nm offer properties of great interest in optoelectronics and plasmonics. Crossbar grating structures--two gratings patterned perpendicular to each other--will play an important role as ultra-high density electrode grids in memristive devices for non-volatile memory. |
| |
Keywords: | |
本文献已被 PubMed 等数据库收录! |
|