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“四低一高”工艺在85kA预焙槽的应用与优化
引用本文:王会全,李政伟.“四低一高”工艺在85kA预焙槽的应用与优化[J].世界有色金属,2003(10):35-37.
作者姓名:王会全  李政伟
作者单位:中国铝业河南分公司电解厂
摘    要:本文介绍了“四低一高”(低电解温度、低分子比、低氧化铝浓度、低阳极效应系数、高工作电压)工艺技术条件在85kA预焙槽上的应用与优化,实验证明“四低一高”工艺需要针对具体槽型进行优化设计,适宜的技术条件对提高电流效率、降低直流电耗,节能效果显著。

关 键 词:85kA预焙槽  工艺技术条件  电流效率  直接电耗

Application of an advanced technology to 85kA prebaked cell and its optimization
Wang Hui-quan,Li Zheng-wei.Application of an advanced technology to 85kA prebaked cell and its optimization[J].World Nonferrous Metals,2003(10):35-37.
Authors:Wang Hui-quan  Li Zheng-wei
Abstract:An account of the application of an ad vanced technology characteristic o f low electrolytic temperature,low molecular ratio,low alumina concen tration,and low anodic effect facto rs but under high working voltage in 85kA pre-baked cell and its optimization are g iven in this paper.The experimental resultsshow that the above -mention ed advanced technology shall be used in combination with optimized design aiming at c oncrete cell type as well as suitable technologi-cal conditions for improvement of electric current efficiency,reducti on of direct current consumption,an d obvious saving of energy.
Keywords:kA prebaked cell  technological c onditions  electric currrent effic iency  direct consumption of electr ic energy  
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