|
|||||
|
|
Physisorption of krypton on thermally oxidized silicon wafers |
|
| Authors: | J. N. Bohra P. T. John R. K. Saxena |
| Affiliation: | (1) Surface Area and Porosity Group, National Physical Laboratory, Dr K. S. Krishnan Road, 110 012 New Delhi, India;(2) Present address: C-1/1027 Vasant Kunj, 110030 New Delhi, India |
| Abstract: | |
| Keywords: | |
| 本文献已被 SpringerLink 等数据库收录！ | |