| 晶片电阻率测试系统校准方法 |
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| 引用本文： | 石雅珍,佟丽英. 晶片电阻率测试系统校准方法[J]. 工业计量, 2010, 20(3): 4-6 |
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| 作者姓名： | 石雅珍 佟丽英 |
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| 作者单位： | 中国电子科技集团公司第四十六研究所,天津,300220 |
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| 摘 要： | 文章对晶片电阻率测试系统的原理、结构及计量特性进行了阐述,给出了校准晶片电阻率测试系统的方法,并对本系统测量结果不确定度进行了评定。
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| 关 键 词： | 电阻率 校准 测量不确定度 |
Calibration Method for Test System of Wafer Electrical Resistivity |
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| SHI Ya-zhen,TONG Li-ying. Calibration Method for Test System of Wafer Electrical Resistivity[J]. Industrial Measurement, 2010, 20(3): 4-6 |
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| Authors: | SHI Ya-zhen TONG Li-ying |
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| Affiliation: | SHI Ya-zhen,TONG Li-ying(The 46th Research Institute,China Electronic Technology Group Corporation,Tianjin 300220,China) |
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| Abstract: | Principle,structure and metrological characteristics of test system for wafer electrical resistivity are described.Calibration method for test system of wafer electrical resistivity is presented.Measurement results and uncertainty of the system are evaluated. |
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| Keywords: | electrical resistivity calitration uncertainty of measurement |
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