| 脉冲多弧离子源的研制 |
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| 引用本文： | 严一心,杭凌侠,朱昌. 脉冲多弧离子源的研制[J]. 光学仪器, 1999, 0(Z1) |
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| 作者姓名： | 严一心 杭凌侠 朱昌 |
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| 作者单位： | 西安工业学院!西安710032 |
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| 摘 要： | 脉冲多弧离子源主要用来镀制类金刚石薄膜及金属、合金膜，研究了脉冲多弧离子源的引弧方法、放电的稳定性、离子源结构对镀膜均匀性的影响。在此基础上，研制了脉冲多弧离子源，利用该源镀制了类金刚石薄膜及镍铬铁合金渐变膜。经测试，膜层性能良好。
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| 关 键 词： | 脉冲多弧 离子源 离子镀 薄膜 |
Research on the Pulsed Multi-arc Ion Source |
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| YAN Yixin HANG Lingxia ZHU Chang. Research on the Pulsed Multi-arc Ion Source[J]. Optical Instruments, 1999, 0(Z1) |
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| Authors: | YAN Yixin HANG Lingxia ZHU Chang |
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| Abstract: | The pulsed multi arc ion source has been used to prepare diamond like (DLC) film and metal film and alloy film. This paper studies its method of ignited arc, stability of discharge and influence of structure of pulsed multi arc ion source on deposition uniformity. On these bases, the pulsed multe arc ion source is prepared. DLC films and the nickel chrome iron alloy gradual change film and deposited by using the ion source. According to the result of testing, the films have good properties. |
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| Keywords: | Pulsed Multi arc Ion Source Ion Plating Thin Film. |
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