| 射频反应溅射氧化铌薄膜的电致变色性能研究 |
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| 引用本文： | 黄银松,章俞之,胡行方.射频反应溅射氧化铌薄膜的电致变色性能研究[J].无机材料学报,2002,17(3):632-636. |
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| 作者姓名： | 黄银松 章俞之 胡行方 |
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| 作者单位： | 中国科学院上海硅酸盐研究所 上海 200050 |
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| 基金项目： | 国家自然科学基金(59932040－2) |
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| 摘 要： | 采用射频反应溅射法成功地制备了非晶态氧化铌薄膜,研究了它们的电致变色性能．这些薄膜在漂白态透明无色,而着色态则为灰褐色．循环伏安测试结果表明该薄膜具有良好的稳定性和很好的锂离子注入/抽出性能．５５０ｎｍ处的着色效率为１６．６８ｃｍ２/Ｃ,在可见光区透过率调制幅度为２０%~３０%．结合Ｘ光电子能谱(ＸＰＳ)分析可以认为氧化铌薄膜的电致变色现象是由于锂离子和电子的共同注入与抽出,导致薄膜中的铌离子发生ＮｂＶ和ＮｂＩＶ间的可逆氧化、还原反应引起的．
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| 关 键 词： | 氧化铌薄膜 电致变色 射频反应溅射 |
| 文章编号： | 1000-324X(2002)03-0632-05 |
| 收稿时间： | 2001-4-24 |
| 修稿时间： | 2001年4月24日 |
Electrochromic Properties of Niobium Oxide Thin Films Fabricated byRF Sputtering |
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| HUANG Yin-Song,ZHANG Yu-Zhi,HU Xing-Fang.Electrochromic Properties of Niobium Oxide Thin Films Fabricated byRF Sputtering[J].Journal of Inorganic Materials,2002,17(3):632-636. |
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| Authors: | HUANG Yin-Song ZHANG Yu-Zhi HU Xing-Fang |
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| Affiliation: | R & D Center of Special Inorganic Materials; Shanghai Institute of Ceramics; Chinese Academy of Sciences; Shanghai 200050; China |
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| Abstract: | Electrochromic Nb2O5 films were prepared successfully by RF sputtering process. These films are transparent in bleached state and brownish gray in colored state. Cyclic voltammetry (CV) measurement results show that the film has good stability, high reversibility of Li^+ insertion/extraction. The coloration efficiency is 16.68cm2/C at 550nm. The difference of transmittance between bleached and colered states is 20%-30% in visible range. XPS results show that the electrochromic properties of the Nb2O5 film can be attributed to the reversible redox reaction between NbV and NbIV with the double injection/extraction of Li+ and e-, which can be described as: mmNbV2O5→ LixNbxIVNb2-xVO5 ←→ Lix-yNbx-yIVNb2-(x-y)VO5 (x≥y). |
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| Keywords: | iobium oxide RF sputtering electrochromism |
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