| 阴极电弧源镀制TiO2薄膜的研究 |
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| 引用本文： | 周友苏,张立珊.阴极电弧源镀制TiO2薄膜的研究[J].现代制造工程,2003(Z1):36-37. |
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| 作者姓名： | 周友苏 张立珊 |
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| 作者单位： | 北京联合大学 |
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| 摘 要： | 在真空条件下利用阴极电弧源在不同基底材料上镀制TiO2薄膜.对影响镀膜过程和膜层质量的氧气工作压强、偏压和电流等因素进行研究.经X射线结构分析结果显示TiO2薄膜主要以锐钛矿结构为主及少量的金红石结构.对TiO2薄膜的化学性质、力学性质进行了初步检测.
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| 关 键 词： | 真空 电弧 薄膜 |
| 文章编号： | 1671-3133(2003)08增-0036-02 |
| 修稿时间： | 2003年7月14日 |
Study of TiO2 thin film plating by cathode electric arc source |
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| Zhou Yousu,Zhang Lishan.Study of TiO2 thin film plating by cathode electric arc source[J].Modern Manufacturing Engineering,2003(Z1):36-37. |
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| Authors: | Zhou Yousu Zhang Lishan |
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| Abstract: | Titanium dioxide thin film on different bases were deposited by the vacuum plating with the cathode electric source. The working pressure of oxygen, bias and current as influences on the depositing process and the quality of the thin film was studied. The configuration of the TiO2 film was main anatase and a little rutile inspected by x - ray diffraction analysis. A preliminary check of the chemical property and the mechanical property of the film was made out. |
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| Keywords: | Vacuum Electric arc Thin film |
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