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Improving Bonding to Piezoelectric Poly(vinylidene fluoride) for Sensor Applications
Authors:G. L. Anderson   D. A. Dillard  J. P. Wightman
Affiliation: a Department of Engineering Science and Mechanics, Virginia Polytechnic Institute and State University, Blacksburg, VA, U.S.A.b Thiokol Corporation, Advanced Technology, Brigham City, UT, U.S.A.c Department of Chemistry, Virginia Polytechnic Institute and State University, Blacksburg, VA, U.S.A.
Abstract:Argon, oxygen, nitrogen and ammonia plasmas and an acid etch pretreatment were performed on uniaxially stretched piezoelectric poly(vinylidene fluoride) film in order to improve wettability and bonding. Oxygen plasma was found to be too harsh, but nitrogen and argon plasmas improved wettability and resulted in a seven-fold increase in 180° peel strengths. However, this improvement in peel strength was accompanied by a 90% decrease in the piezoelectric properties of the polymer. The acid etch yielded contact angles similar to those of the plasma treated material, and improved peel strengths some twelve times over that of the untreated film. Significantly, no piezoelectric loss resulted from the acid etch.
Keywords:poly(vinylidene fluoride)  wettability  plasma pretreatment  failure loci  polymer acid etch  piezoelectric polymers  peel strength  XPS analysis  contact angle  strain energy release rates
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