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Thin film formation by the thermal decomposition of hexamethyldisilazane in a hot wall reactor
Affiliation:1. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas (INIFTA), Facultad de Ciencias Exactas, Universidad Nacional de La Plata - CONICET, Sucursal 4 Casilla de Correo 16, 1900 La Plata, Argentina;2. Área de Química Física, Departamento de Química, Facultad de Ciencias, Universidad de La Laguna, Instituto de Materiales y Nanotecnología, Avda. Francisco Sánchez, s/n, 38071 La Laguna, Tenerife, Spain;1. Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, PR China;2. University of Chinese Academy of Sciences, Beijing 100049, PR China;3. KTH Royal Institute of Technology, Brinellv. 8, 10044 Stockholm, Sweden;1. Department of Mechanical Engineering, Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, South Korea;2. SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, South Korea
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