| HTM技术中细微图形成形效果的衍射理论分析与实验结果 |
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| 引用本文： | 郭建,金基用,林承武,明星,周伟峰,李斗熙. HTM技术中细微图形成形效果的衍射理论分析与实验结果[J]. 液晶与显示, 2008, 23(3): 327-333 |
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| 作者姓名： | 郭建 金基用 林承武 明星 周伟峰 李斗熙 |
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| 作者单位： | 北京京东方光电科技有限公司,北京,100176 |
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| 摘 要： | 针对使用半色调掩膜技术的TFT LCD玻璃基板曝光过程中的衍射和干涉现象进行了分析.文中给出了衍射和干涉现象的理论模型,并且对这两种现象在HTM技术中所起的作用进行了解释,尤其针对不同的狭缝宽度和狭缝间距的结构进行了分析.给出了扫描电镜的图片做为进一步的说明.
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| 关 键 词： | 半色调掩膜 灰色调掩膜 薄膜晶体管液晶显示器 曝光 衍射 halftone mask gray tone mask TFT LCD exposure diffraction 微图形 成形 效果 衍射理论 分析 实验 结果 Forming Process Pattern Fine Mask Phenomenon Interference Diffraction Result Experiment graphs provided demonstration especially |
| 文章编号： | 1007-2780(2008)03-0327-07 |
| 修稿时间： | 2008-01-02 |
Analysis and Experiment Result of Diffraction and Interference Phenomenon in Halftone Mask Fine Pattern Forming Process |
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| GUO Jian,KIM Ki-yong,RIM Seung-moo,MING Xing,ZHOU Wei-feng,LEE Doo-hee. Analysis and Experiment Result of Diffraction and Interference Phenomenon in Halftone Mask Fine Pattern Forming Process[J]. Chinese Journal of Liquid Crystals and Displays, 2008, 23(3): 327-333 |
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| Authors: | GUO Jian KIM Ki-yong RIM Seung-moo MING Xing ZHOU Wei-feng LEE Doo-hee |
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| Abstract: | Diffraction and interference phenomenon in the halftone mask fine pattern forming process was analyzed.The theoretical model of diffraction and interference was brought forward firstly and its effect at different HTM pattern forming process was explained,especially the patterns with various slit length and intervals.SEM graphs were also provided for the further demonstration. |
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| Keywords: | halftone mask gray tone mask TFT LCD exposure diffraction |
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