| 真空电弧沉积技术中的弧源设计 |
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| 引用本文： | 程仲元,王珉.真空电弧沉积技术中的弧源设计[J].真空科学与技术学报,1999,19(2). |
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| 作者姓名： | 程仲元 王珉 |
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| 作者单位： | 南京航空航天大学机电工程学院!南京210016 |
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| 摘 要： | 讨论了真空电弧沉积中弧源设计的有关问题 ,如电弧运行模式、电弧极性、点火方式、电弧的约束方式以及宏观粒子抑制方式等。分析表明 ,合理选择电弧运行模式和电弧极性 ,以满足涂料粒子蒸发与离化的要求 ;选择合适的弧源结构 ,加强对电弧的约束与烧蚀的控制 ,或用过滤弧源 ,以抑制宏观粒子对涂层的污染 ,是成功设计弧源的关键
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| 关 键 词： | 真空电弧 沉积 弧源 |
Arc Source Design in Vacuum Arc Deposition |
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| Cheng Zhongyuan,Wang Min.Arc Source Design in Vacuum Arc Deposition[J].JOurnal of Vacuum Science and Technology,1999,19(2). |
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| Authors: | Cheng Zhongyuan Wang Min |
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| Abstract: | Several technical problems in arc source design,including arc mode,arc polarity,ignition mechanism and arc confinement and macroparticle reduction were discussed.Successful design of a high quality arc source depends on a number of factors.For instance,arc mode and arc polarity strongly affect evaporation and ionization of the coating particles;appropriate arc source structures may considerable enhance arc tract control and reduce erosion;incorporation of a macroparticle filter may effectively lessen macroparticle contamination of the coating. |
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| Keywords: | Vacuum arc Deposition Arc source |
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