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High efficiency metal ion source |
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| Authors: | Akira Tonegawa Kazuo Yamauchi Junichio Ono Takayuki Chida and Kazuo Takayama |
| Affiliation: | a Department of Physics, School of Science, Tokai University, 1117 Kitakamane, Hiratsuka, Kanagawa, 259-12, Japan b Institute of Research & Development, Tokai University, 1117 Kitakamane, Hiratsuka, Kanagawa, 259-12, Japan |
| Abstract: | A double hollow cathode ion source can produce a high amount and high current density of metal ions (Mo) by using a new sputtering discharge mode of hollow cathode discharge. It is evident that the new sputtering discharge mode occurs under suitable conditions of the diameter of the second hollow cathode and the magnetic field. At a sputter voltage of 600 V and magnetic field of 1.0 kG, the metal ion beam ratio of  reaches  50%. |
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