| 用于高灵敏度红外探测器的超薄硅膜的研制 |
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| 引用本文： | 董典红,徐晨,邹德恕,李兰,杨道虹,张剑铭,阳启明,沈光地.用于高灵敏度红外探测器的超薄硅膜的研制[J].红外与激光工程,2005,34(1):23-26. |
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| 作者姓名： | 董典红 徐晨 邹德恕 李兰 杨道虹 张剑铭 阳启明 沈光地 |
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| 作者单位： | 北京工业大学,电子与信息控制工程学院,北京市光电子技术实验室,北京,100022 |
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| 基金项目： | 北京市教委科技发展项目(KM200310005009) |
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| 摘 要： | 超薄、平整的硅膜对于制作高灵敏度红外探测器是非常重要的。这种超薄硅膜的各向异性腐蚀技术，包括有机溶液EPW和无机溶液KoH及KoH IPA(异丙醇)。从腐蚀速率、腐蚀表面质量、腐蚀停特性、腐蚀边缘形貌及腐蚀工艺的角度分析比较了两种腐蚀系统，分别制作出了约1μm厚的平整超薄硅膜，并研究了不同掩膜材料在腐蚀液中的抗蚀性，为高灵敏度红外探测器的制作奠定了工艺基础。
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| 关 键 词： | 超薄硅膜 各向异性腐蚀 高灵敏度红外探测器 |
| 文章编号： | 1007-2276(2005)01-0023-04 |
| 收稿时间： | 2004/3/18 |
| 修稿时间： | 2004年3月18日 |
Fabrication and research of very thin Si membrane for the high sensitivity infrared detector |
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| DONG Dian-hong,XU Chen,ZOU De-shu,LI Lan,YANG Dao-hong,ZhANG Jian-ming,YANG Qi-ming,SHEN Guang-di.Fabrication and research of very thin Si membrane for the high sensitivity infrared detector[J].Infrared and Laser Engineering,2005,34(1):23-26. |
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| Authors: | DONG Dian-hong XU Chen ZOU De-shu LI Lan YANG Dao-hong ZhANG Jian-ming YANG Qi-ming SHEN Guang-di |
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| Abstract: | Very thin and flat silicon membrane is the most important part for fabricating high sensitivity infrared detectors. The investigation of anisotropic etching of silicon with organic (EPW) and inorganic (KOH, KOH+IPA) solutions is presented to fabricate this very thin Si membrane. These two etching technologies are compared in point of the etching rate, the quality of etched surface, etch-stop character, the morphology of etching edges and etching procedures. Very thin silicon membranes of less 1μm thick are fabricated with these technologies respectively. The mask materials resistant in etching solutions are presented. These works provide the useful technology foundation for the fabrication of the high sensitivity infrared detector. |
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| Keywords: | Very thin Si membrane Anisotropic etching High sensitivity infrared detector |
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