应力对薄膜偏振分束镜性能的影响及改进工艺

为了研究应力对薄膜偏振分束镜性能的影响和减少应力的方法,通过在镀制分光膜之前预镀Al2O3过渡层,镀制过程中提高真空度、升高基底温度、减慢薄膜沉积速率,以及封装过程中采用光学光敏胶紫外光照射快速凝固法来减少薄膜应力。利用CCD采集了工艺改进前后薄膜偏振分束镜反射光和透射光的光斑图像,利用消光比测试系统测量了工艺改进前后薄膜偏振分束镜反射光和透射光的消光比。结果表明,改进工艺后反射光和透射光的光斑能量更加集中,散斑现象变小;反射光和透射光的消光比特性明显提高。由此可见,通过改进镀制工艺和封装工艺可以使薄膜偏振分束镜的指标达到使用要求。

Effect of stress on performance of thin film polarizing beam splitters and improvement process techniques

In order to investigate effect of the stress on the thin film polarizing beam sputters and seek the techniques to reduce stress.prior to the deposition polarizing splitter coatings,Al203 buffer layer was coated,the degree of vacuum was improved,the substrate temperature was increased, the film deposition rate was slowed down during deposition processes.During encapsulation process,optical photosensitive adhesive rapid solidification under UV irradiation was used. The spot images of reflected light and transmitted light of the thin film polarizing beam sputter were collected with CCD before and after process improvement respectively.The extinction ratios of reflected light and transmitted light of the thin film polarizing beam splitter were measured before and after process improvement respectively. The results indicate that after applying improved technologies, the spot energy of reflected and transmitted light is more concentrated, speckle phenomenon becomes smaller; the extinction ratios characteristic of reflected and transmission light dramatically are improved.Thus,thin film polarizing beam sputters can reach the application requirements by optimizing the process and packaging technology.