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磁控溅射法制备的不同衬底上的TiO_2薄膜
引用本文:郭智文,姜坤,吴宝嘉,顾广瑞. 磁控溅射法制备的不同衬底上的TiO_2薄膜[J]. 延边大学学报(自然科学版), 2012, 0(1): 41-43,70
作者姓名:郭智文  姜坤  吴宝嘉  顾广瑞
作者单位:延边大学理学院物理系,吉林延吉133002
基金项目:国家自然科学基金资助项目(11164031); 教育部留学归国人员科研启动基金资助项目(教外司留[2009]1341号)
摘    要:利用射频磁控溅射方法,分别在改变氧气含量和沉积时间的条件下在ITO玻璃、Si和Al/ITO玻璃衬底上沉积了TiO2薄膜,并利用拉曼光谱表征了2种条件下的TiO2薄膜的结构.研究表明:衬底材料、氧气含量以及沉积时间明显地影响了TiO2薄膜的结构.随着氧气含量的降低,沉积在ITO玻璃衬底上的TiO2薄膜由锐钛矿和金红石的混合结构转变为单一的金红石结构,而沉积在Si衬底上的TiO2薄膜的结构没有改变,并保持单一的金红石结构;随着沉积时间的增加,Al/ITO玻璃衬底上的TiO2薄膜由金红石结构转变为锐钛矿结构.

关 键 词:TiO2薄膜  磁控溅射  拉曼光谱  金红石  锐钛矿

TiO_2 thin films deposited on different substrates by magnetron sputtering
GUO Zhi-wen,JIANG Kun,WU Bao-jia,GU Guang-rui. TiO_2 thin films deposited on different substrates by magnetron sputtering[J]. Journal of Yanbian University (Natural Science), 2012, 0(1): 41-43,70
Authors:GUO Zhi-wen  JIANG Kun  WU Bao-jia  GU Guang-rui
Affiliation:(Department of Physics,College of Science,Yanbian University,Yanji 133002,China)
Abstract:TiO2 thin films are deposited on ITO glass and Si substrates at different oxygen content and on Al/ITO glass substrates at different deposition time by radio frequency(RF) magnetron sputtering.The structure of the above TiO2 thin films is studied by Raman spectra.The final analysis indicats that the structure of TiO2 thin films is strongly influenced by the oxygen content,substrate materials and deposition time.With decreasing oxygen content,the structure of the TiO2 films deposited on ITO glass substrates changed from the mixed structure of anatase and rutile to the single anatase structure,and the structure of TiO2 thin films deposited on Si substrates is not changed and kept only rutile structure.With increasing deposition time,the structure of TiO2 thin films deposited on Al/ITO glass substrates changed from the rutile structure to the anatase structure.
Keywords:TiO2 thin film  magnetron sputtering  Raman spectrum  rutile  anatase
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