| 室温下高速沉积AZO薄膜的研究 |
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| 引用本文： | 李伟民,郝会颖.室温下高速沉积AZO薄膜的研究[J].材料导报,2011(Z2):83-84,90. |
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| 作者姓名： | 李伟民 郝会颖 |
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| 作者单位： | 中国地质大学材料科学与工程学院 |
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| 基金项目： | 中央高校基本科研业务费专项资金(2011YYL006);中国科学院半导体材料科学重点实验室开放基金(KLSMS-0907) |
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| 摘 要： | 在室温下,采用射频磁控溅射技术以较大的功率密度(7W/cm2)沉积了一系列掺铝氧化锌(AZO)透明导电薄膜,探索了溅射压强对沉积速率及薄膜性能的影响。结果表明,当工作压强为2.0Pa时,高速(67nm/min)沉积得到的薄膜的电阻率为2.63×10-3Ω.cm,可见光平均透过率为83%,并且在薄膜表面有一定的织构。
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| 关 键 词： | 室温 压强 AZO 高速 磁控溅射 |
Study of AZO Thin Films Deposited at Room Temperature with High Rate |
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| LI Weimin,HAO Huiying.Study of AZO Thin Films Deposited at Room Temperature with High Rate[J].Materials Review,2011(Z2):83-84,90. |
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| Authors: | LI Weimin HAO Huiying |
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| Affiliation: | (School of Materials Science and Technology,China University of Geosciences,Beijing 100083) |
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| Abstract: | A series of aluminium-doped zinc oxide(AZO) films were prepared by radio-frequency magnetron sputtering deposition system with high power density at room tempereature.Effects of pressure on the deposition rate and properties of the films were investigated.Low resitivity of 2.63×10-3Ω·cm and high average visible transmittance about 83% are obtained at the working pressure of 2.0Pa with a high depositon rate of 67nm/min,some surface textures are formed. |
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| Keywords: | room temperature pressure AZO high rate magnetron sputtering |
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