TiOx/Ag/TiOx multilayer for application as a transparent conductive electrode and heat mirror |
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Authors: | Chu-Chun Wu Pang Shiu Chen Cheng-Hsiung Peng Ching-Chiun Wang |
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Affiliation: | 1. Department of Chemical and Materials Engineering, MingHsin University of Science and Technology, Hsinfeng, Hsinchu, 304, Taiwan, Republic of China 2. Mechanical and Systems Research Laboratories, Industrial Technology Research Institute, ChuTong, Hsinchu, 304, Taiwan, Republic of China
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Abstract: | Amorphous TiOx films and Ag layer were deposited by electron-beam evaporation on soda-lime glass at room temperature. The details regarding the structure, surface morphology, and optical properties of the as-prepared TiOx films were examined by X-ray diffraction, scanning electron microscopy, and ultra-violet (UV) -visible-near-infrared (NIR) spectrometry. The TiOx films exhibit amorphous phase with an optical band gap of 3.35 eV. The polygrains oriented along the (111) and (200) directions in the Ag films were adopted to supply carriers into the TiOx film and lower the sheet resistance of the stacked layer. The multilayer exhibited a sufficiently large Ag thickness (>15 nm), low resistance, high UV transmittance, visible transmittance, and high NIR reflection. Dependence of Ag thickness, TiOx bottom-layer, and TiOx overlayer on the optical and electrical properties of TiOx/Ag/TiOx were explored. A figure of merit (FOM) was used to find an optimal structure for a multilayer with superior conductivity and visible transparency. An FOM of 9.8 × 10?2 (Ω?1) at the visible wavelength of 550 nm for a TiOx/Ag/TiOx stacked layer with an 18-nm-thick Ag and a 20-nm-thick TiOx was achieved. The TiOx/Ag/TiOx sample annealed at 500 °C 10 min also shows a good thermal stability. |
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