Electrografting of the cyanomethyl radical onto carbon and metal surfaces |
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Authors: | C Combellas F Kanoufi Z Osman J Pinson A Adenier G Hallais |
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Affiliation: | aPhysico-Chimie des Electrolytes, des Colloïdes et Sciences Analytiques, ESPCI ParisTech, CNRS UMR 7195, 10 rue Vauquelin, 75231 Paris Cedex 05, France;bITODYS, Université Paris Diderot, CNRS UMR 7086, 15 rue Jean de Baïf, 75013 Paris, France;cAlchimer, 15 rue du Buisson aux Fraises, 91300 Massy, France |
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Abstract: | Nanometer layers are grafted on the surface of carbon or metallic electrodes by electrochemical reduction of iodo or bromoacetonitrile in acetonitrile. The structure of these layers, (carbon or metal)–CH2–CH(NH2)–]n, is determined by electrochemistry, ellipsometry and IRRAS. The bond between the surface and the organic layer is evidenced by ToF-SIMS. A mechanism is proposed to account for the formation of the layers: the grafting is assigned to the reaction of the cyanomethyl radical, CH2CN, with the electrode surface and the latter is partly reduced to the cyanomethyl anion −CH2CN that attacks the first grafted –CH2CN group, leading to the growth of the layer. It is also possible to produce the same radical by oxidation of the −CH2CN anion -obtained by deprotonation of acetonitrile-, but in this case only traces of grafting are detected on the electrode as the radical is trapped by the large excess of anions. |
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Keywords: | Iodoacetonitrile Bromoacetonitrile Organic layers Grafting Cyanomethyl radical |
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