| SiO2平面光波导的PECVD制备和膜层特性研究 |
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| 引用本文： | 陈思乡,江征风,胡业发,刘文. SiO2平面光波导的PECVD制备和膜层特性研究[J]. 光通信研究, 2005, 0(5): 68-70 |
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| 作者姓名： | 陈思乡 江征风 胡业发 刘文 |
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| 作者单位： | 武汉理工大学,机电工程学院,湖北,武汉,430070;武汉邮电科学研究院,湖北,武汉,430074 |
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| 摘 要： | 研究了等离子体增强化学汽相沉积（PECVD）的光波导膜层的光学特性，论述了沉积工艺参量和退火处理对膜层性能的影响，优化工艺获得了高质量的波导膜层，成功设计制作了在1 550nm中心波长损耗低于0.1db/cm的平面光波导和阵列波导光栅（AWG）器件。
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| 关 键 词： | 平面光波导 SiO2波导 等离子体增强化学汽相沉积 |
| 文章编号： | 1005-8788(2005)05-0068-03 |
| 收稿时间： | 2004-12-03 |
| 修稿时间： | 2004-12-03 |
PECVD deposition of silica plane waveguides and the film properties |
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| CHEN Si-xiang,JIANG Zheng-feng,HU Ye-fa,LIU Wen. PECVD deposition of silica plane waveguides and the film properties[J]. Study on Optical Communications, 2005, 0(5): 68-70 |
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| Authors: | CHEN Si-xiang JIANG Zheng-feng HU Ye-fa LIU Wen |
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| Abstract: | This paper studied the optical properties of SiO_2 layers obtained by use of plasme-enhanced chemical vapor deposition (PECVD), expounded the effect of deposition parameters and annealing on the layer properties. Through optimization of process technology, we obtained high-quality waveguide film layer and fabricated low-loss planar optical waveguide and AWG devices whose propagation loss is less than 0.1 dB/cm at 1 550 nm (center wavelength). |
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| Keywords: | planar optical waveguide silica waveguides PECVD |
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