| 磁射流抛光时几种工艺参数对材料去除的影响 |
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| 引用本文： | 张学成,戴一帆,李圣怡,彭小强.磁射流抛光时几种工艺参数对材料去除的影响[J].光学精密工程,2006,14(6):1004-1008. |
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| 作者姓名： | 张学成 戴一帆 李圣怡 彭小强 |
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| 作者单位： | 国防科技大学,机电工程与自动化学院机电工程系,湖南,长沙,410073;国防科技大学,机电工程与自动化学院机电工程系,湖南,长沙,410073;国防科技大学,机电工程与自动化学院机电工程系,湖南,长沙,410073;国防科技大学,机电工程与自动化学院机电工程系,湖南,长沙,410073 |
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| 摘 要： | 研究了磁射流抛光时几种工艺参数对材料去除的影响。首先介绍了磁射流抛光的原理和实验装置,然后从实验出发研究了磁射流抛光中材料的去除。利用标准的磁流变液进行了一系列定点抛光实验。重点研究了冲击角、工作距离、射流速度和磁场强度对抛光区形状和去除量的影响,获得了相应的关系曲线。运用计算流体力学方法分析了材料去除机理。为进一步研究磁射流抛光的各种参数的最佳匹配,实现磁射流抛光的数控加工奠定了基础。
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| 关 键 词： | 磁射流抛光 射流稳定性 抛光区 去除机理 |
| 文章编号： | 1004-924X(2006)06-1004-05 |
| 收稿时间： | 2006-05-08 |
| 修稿时间： | 2006-09-15 |
Effect on material removal of magnetorheological jet polishing by several parameters |
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| ZHANG Xue-cheng,DAI Yi-fan,LI Sheng-yi,PENG Xiao-qiang.Effect on material removal of magnetorheological jet polishing by several parameters[J].Optics and Precision Engineering,2006,14(6):1004-1008. |
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| Authors: | ZHANG Xue-cheng DAI Yi-fan LI Sheng-yi PENG Xiao-qiang |
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| Affiliation: | College of Mechatronic Engineering and Automation, National University of Defense Technology, Changsha 410073, China |
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| Abstract: | The effects on material removal of MJP(Magnetorheological Jet Polishing) by several parameters were given.Firstly,the mechanism and experiment set-up of MJP were introduced.Then the material removal of MJP was investigated in the experiment.A series of spot polishing experiments were conducted using the standard magnetorheological fluid.The effects of impact angle,stand-off distance,jet velocity and magnetic intensity on polishing were mainly studied.And the relation curve between each parameter and the amount of removal was obtained.The mechanism of material removal was analyzed by computational fluid dynamics.The experiment results lay a foundation for further research of best parameter matching for MJP,and for the implementation of numerical control of MJP. |
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| Keywords: | Magnetorheological Jet Polishing jet stabilization polishing spot removal mechanism |
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