| 变形电子束曝光机成形偏转器的设计和性能 |
| |
| 引用本文： | 康念坎,江钧基,吴伟,黄兰友,吴明均.变形电子束曝光机成形偏转器的设计和性能[J].电子与信息学报,1990,12(2):161-168. |
| |
| 作者姓名： | 康念坎 江钧基 吴伟 黄兰友 吴明均 |
| |
| 作者单位： | 中国科学院电子学研究所 北京
(康念坎，江钧基，吴伟)，中国科学院科学仪器厂 北京
(黄兰友)，中国科学院科学仪器厂 北京(吴明均) |
| |
| 摘 要： | 在变形电子束曝光机中,为使曝光均匀必须保证靶上束斑电流密度物边缘分辨率不随束斑形状和尺寸的变化而改变。实现这一目标的关键是正确设计成形偏转器。本文讨论采用高灵敏度平行板偏转器实现成形偏转时,为达到上述目标应进行的线性补偿和旋转补偿的设计计算方法。给出了用实验方法改变电子源象与偏转板几何中心的轴向距离所测得的线性补偿因子和旋转补偿因子的值。实验结果与计算值符合较好。
|
| 关 键 词： | 电子束曝光机 电子光学 偏转器 |
| 收稿时间： | 1988-12-28 |
| 修稿时间： | 1989-10-31 |
DESIGN AND PERFORMANCE OF SHAPING DEFLECTORS FOR VARIABLE SHAPED ELECTRON BEAM LITHOGRAPHY |
| |
| Kang Niankan,Jiang Junji,Wu Wei,Huang Lanyou,Wu Mingjun.DESIGN AND PERFORMANCE OF SHAPING DEFLECTORS FOR VARIABLE SHAPED ELECTRON BEAM LITHOGRAPHY[J].Journal of Electronics & Information Technology,1990,12(2):161-168. |
| |
| Authors: | Kang Niankan Jiang Junji Wu Wei Huang Lanyou Wu Mingjun |
| |
| Affiliation: | Institute of Electronics Academia Sinica Beijing;Scientific Instruments Factory, Academia Sinica, Beijing |
| |
| Abstract: | In order to obtain uniform exrnosure in variable shaped electron beam lithography, the beam current density and edge resolution on the target must not change for different spot shapes and sizes. The key to the goal is the anpropriate design of shaping deflectors. A linear and rotation compensation approach is presented. Values of linear and rotation compensation factors versus the distances between electron source image and centers of deflectors are measured on an experimental electron beam column with variable spot shaping. The experimental results are in good agreement with the calculated ones. |
| |
| Keywords: | Electron beam lithography Electron optics Shaping deflector |
| 本文献已被 CNKI 等数据库收录！ |
| 点击此处可从《电子与信息学报》浏览原始摘要信息 |
|
点击此处可从《电子与信息学报》下载全文 |
