| 蓝宝石衬底上制备SiO2薄膜的研究 |
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| 引用本文： | 冯丽萍,刘正堂,刘文婷,李阳平,陈继权. 蓝宝石衬底上制备SiO2薄膜的研究[J]. 材料科学与工艺, 2005, 13(2): 131-134 |
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| 作者姓名： | 冯丽萍 刘正堂 刘文婷 李阳平 陈继权 |
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| 作者单位： | 西北工业大学,材料科学与工程学院,陕西,西安,710072 |
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| 摘 要： | 采用射频磁控反应溅射法,以高纯Si为靶材,高纯O2为反应气体,成功地在蓝宝石基片上制备出了二氧化硅(SiO2)薄膜,并对薄膜的沉积速率、成分、结构及红外光学性能进行了研究.结果表明,制备的SiO2薄膜与蓝宝石衬底结合牢固;和其它镀膜技术相比,射频磁控反应溅射法可以在较低的温度下制备出SiO2薄膜;制备出的SiO2薄膜在3～5μm波段对蓝宝石衬底有明显的增透效果.
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| 关 键 词： | 磁控反应溅射 蓝宝石 二氧化硅薄膜 |
| 文章编号： | 1005-0299(2005)02-0131-04 |
| 修稿时间： | 2003-09-17 |
Investigation on SiO2thin films prepared on sapphire |
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| Feng Li-ping,LIU Zheng-Tang,LIU Wen-ting,LI Yang-ping,CHEN Ji-quan. Investigation on SiO2thin films prepared on sapphire[J]. Materials Science and Technology, 2005, 13(2): 131-134 |
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| Authors: | Feng Li-ping LIU Zheng-Tang LIU Wen-ting LI Yang-ping CHEN Ji-quan |
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| Abstract: | SiO2 thin film is successfully prepared on sapphire substrate by RF magnetron reactive sputtering method, with silicon as the target and oxygen as the reactive gas. The deposition rate, composition, structure and optical properties of SiO2 films have been also investigated. The results show that SiO2 films can be obtained at lower temperature by RF magnetron reactive sputtering method and it also adhere sapphire substrate firmly. The deposited SiO2 film has a highly antireflective effect on sapphire substrate. |
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| Keywords: | magnetron reactive sputtering sapphire SiO2 films |
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