| 三氧化钨的光催化氧化性能研究 |
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| 引用本文： | 解恒参,朱亦仁.三氧化钨的光催化氧化性能研究[J].工业用水与废水,2004,35(4):45-48. |
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| 作者姓名： | 解恒参 朱亦仁 |
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| 作者单位： | 徐州师范大学,化学系,江苏,徐州,221116;徐州师范大学,化学系,江苏,徐州,221116 |
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| 摘 要： | 以草浆造纸废水为研究对象,对半导体WO3光催化氧化的性能进行了研究,结果表明,当废水的ρ(CODCr)为903mg/L时,在pH=8.08,WO3用量为0.01g/10mL水样,H2O2(30%)与废水的体积比为4%的条件下,用UV光照射6h,废水的CODCr的去除率达94.46%,出水ρ(CODCr)为50mg/L。
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| 关 键 词： | 造纸废水 废水处理 光催化氧化 三氧化钨 |
| 文章编号： | 1009-2455(2004)04-0045-04 |
| 修稿时间： | 2004年2月2日 |
A Study of Photocatalytic Oxidation Performance of WO3 |
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| XIE Heng-can,ZHU Yi-ren.A Study of Photocatalytic Oxidation Performance of WO3[J].Industrial Water & Wastewater,2004,35(4):45-48. |
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| Authors: | XIE Heng-can ZHU Yi-ren |
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| Abstract: | The photocatalytic oxidation performance of WO3, which is a semiconductor, was studied, with the wastewater from paper-making industry using straw pulp as the object of the study. The result showed when the ρ(CODCr) of the wastewater was 903 mg/L, under the conditions of pH=8.08 and that the dosage of WO3 was 0.01g/10 ml of water sample, the volumetric ratio of H2O2(30%) to wastewater was 4%, and with irradiation with ultraviolet rays for 6 hours, the removal rate of the CODCr of the wastewater reached 94.46%, and the ρ(CODCr) of the effluent water was 50 mg/L. |
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| Keywords: | wastewater from paper mill waste water treatment photocatalytic oxidation WO_3 |
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