| 掺杂Ti对Fe－N薄膜结构与磁性的影响 |
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| 引用本文： | 王合英,姜恩永,白海力,吴萍,刘明升.掺杂Ti对Fe－N薄膜结构与磁性的影响[J].金属学报,1996(11). |
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| 作者姓名： | 王合英 姜恩永 白海力 吴萍 刘明升 |
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| 作者单位： | 天津大学，天津大学应用物理系 |
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| 基金项目： | 国家自然科学基金,中关村联合测试基金,天津市21世纪青年科学基金 |
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| 摘 要： | 用对向靶溅射仪制备出含多量Ｆｅ（１６）Ｎ２相的（Ｆｅ，Ｔｉ）－Ｎ薄膜，研究了掺杂Ｔｉ对Ｆｅ－Ｎ薄膜结构与磁性的影响，在溅射Ｆｅ－Ｎ薄膜时加入适量的Ｔｉ可提高Ｆｅ－Ｎ薄膜中Ｆｅ（１６）Ｎ２相的含量．Ｔｉ含量（原子分数）在０—２５％时薄膜饱和磁化强度均高于纯Ｆｅ的值；Ｔｉ浓度为１０％时，薄膜磁化强度高达２．６８Ｔ，比纯Ｆｅ的饱和磁化强度值高２０％．
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| 关 键 词： | 对向靶溅射，Fe＿（16）N＿2薄膜，Ti掺杂，磁性，结构 |
EFFECTS OF Ti DOPING ON THE STRUCTURE AND MAGNETIC PROPERTY OF Fe-N FILMS |
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| WANG Heying, JIANG Enyong,BAI Haili,WU Ping,LIU Mingsheng.EFFECTS OF Ti DOPING ON THE STRUCTURE AND MAGNETIC PROPERTY OF Fe-N FILMS[J].Acta Metallurgica Sinica,1996(11). |
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| Authors: | WANG Heying JIANG Enyong BAI Haili WU Ping LIU Mingsheng |
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| Abstract: | Fe,Ti)-N films with high content of Fe16N2 phase are prepared by facing target sputtering. Influences of doped titanium content on the structure and magnetic properties of Fe-N films are investigated. According to XRD and TEM results, optimum Ti additions enhance the formation of the 16:2 nitride, the values of saturation magnetization Bs for (Fe,Ti)-N films with Ti atomic fraction of 0 25% are larger than that for pure bcc iron, the maximum value for Bs is 2.68 T for the sample with 10% Ti, this value is 20% larger than that for pure bcc iron. |
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| Keywords: | facing target sputtering Fe16N2 thin film Ti doping magnetic property structure |
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