Thermal stability of nanocrystalline diamond films grown by biased enhanced microwave plasma chemical vapor deposition |
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Authors: | Sharda T Soga T Jimbo T Umeno M |
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Affiliation: | Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466 8555, Japan. |
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Abstract: | The thermal stability of nanocrystalline diamond (NCD) films grown on mirror-polished silicon substrates by biased enhanced microwave plasma chemical vapor deposition was investigated. Different pieces of a NCD sample were annealed for 1 h in an ambient argon atmosphere at 200, 400, 600, and 800 degrees C. The structural and mechanical properties of as-grown and annealed samples were assessed. The surface roughness and high hardness of the samples remained fairly constant with annealing temperature. |
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