| 193nm浸入式光刻技术独树一帜 |
| |
| 引用本文： | 翁寿松.193nm浸入式光刻技术独树一帜[J].电子工业专用设备,2005,34(7):11-14. |
| |
| 作者姓名： | 翁寿松 |
| |
| 作者单位： | 无锡市罗特电子技术有限公司,江苏,无锡,214001 |
| |
| 摘 要： | 介绍了193nm浸入式光刻机和193nm光刻胶的最新发展动态以及下一代193nm浸入式光刻机。
|
| 关 键 词： | 浸入式光刻技术 193nm光刻机 193nm光刻胶 |
| 文章编号： | 1004-4507(2005)07-0011-04 |
| 修稿时间： | 2005年6月15日 |
The 193nm Immersion Lithography Technology Fly One's Own Colours |
| |
| WENG Shou-song.The 193nm Immersion Lithography Technology Fly One''''s Own Colours[J].Equipment for Electronic Products Marufacturing,2005,34(7):11-14. |
| |
| Authors: | WENG Shou-song |
| |
| Abstract: | In this paper, the recent developments in the 193 nm immersion lithography eguipment, the 193 nm photoresisfs and next 193 nm immersion lithography systems are introduced. |
| |
| Keywords: | Immersion lithography technology 193 nm lithography equipment 193 nm photoresist |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
