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单基片多次曝光实现光栅拼接的理论分析
引用本文:钱国林,吴建宏,李朝明.单基片多次曝光实现光栅拼接的理论分析[J].光学仪器,2008,30(6).
作者姓名:钱国林  吴建宏  李朝明
基金项目:863计划资助项目  
摘    要:为减少光栅拼接过程中需要控制的物理量,提出了一种利用单基片多次曝光实现光栅拼接的理论方案。这种拼接方法不但降低了光栅拼接难度,而且还避免了拼接完成后小光栅间的相对移动。对该方案的原理进行了分析,并模拟计算了两块光栅在面内的拼缝和转动对远场光斑特性的影响,获得了无像差情况下光栅拼接的精度。

关 键 词:光栅拼接  远场衍射  拼接误差  惯性约束聚变

Theoretical analysis of tiled grating by multiple-exposure hologram on single substrate
QIAN Guolin,WU Jianhong,LI Chaoming.Theoretical analysis of tiled grating by multiple-exposure hologram on single substrate[J].Optical Instruments,2008,30(6).
Authors:QIAN Guolin  WU Jianhong  LI Chaoming
Abstract:In order to reduce the number of physical quantity which are need to be controlled in the progress of tiled grating,a theoretic project of multiple-exposure hologram on single substrate is put forward.The method not only reduces the tiled grating difficulty,but also avoids the movement of the small gratings when the tiled grating is completed.The principle of tiled grating is analyzed and the far-field diffraction pattern impacted by the in-plane shift and rotation of two gratings is also simulated.Finally,in the situation of without optical aberration the precision of the tiled grating is obtained.
Keywords:tiled grating  far-field diffraction  tiling error  inertial confinement fusion
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