| 室温磁控溅射制备(Ti,Zr)N薄膜及其性能研究 |
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| 引用本文： | 黄佳木,徐成俊,王亚平. 室温磁控溅射制备(Ti,Zr)N薄膜及其性能研究[J]. 材料科学与工程学报, 2005, 23(5): 517-520 |
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| 作者姓名： | 黄佳木 徐成俊 王亚平 |
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| 作者单位： | 重庆大学材料学院,重庆,400045;重庆大学材料学院,重庆,400045;重庆大学材料学院,重庆,400045 |
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| 摘 要： | 采用直流反应磁控溅射工艺,在载波片和Al基材上制备出金黄色的(Ti,Zr)N薄膜.(Ti,Zr)N薄膜具有比TiN薄膜更高的硬度和更强的耐腐蚀性能.用XRD衍射方法和扫描隧道显微镜对薄膜的晶体结构、微观表面形貌和电子结构进行了测试分析.XRD结果表明,(Ti,Zr)N薄膜为多晶态,存在TiN和ZrN两种分离相;从表面形貌可知,薄膜表面平整,晶粒排列致密且无连接松散的大颗粒;STS谱表明,Zr掺杂后,禁带宽度仍为1.64eV,但在禁带内增加了新能级,新能级的宽度分别为0.33eV和0.42eV,这也正是掺杂Zr后,薄膜仍呈现金黄色的主要原因.
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| 关 键 词： | (Ti Zr)N薄膜 金黄色 表面形貌 电子结构 多晶态 |
| 文章编号： | 1004-793X(2005)05-0517-04 |
| 修稿时间： | 2004-11-05 |
Deposition and Characterization of Magnetron Sputter (Ti, Zr)N Coatings on Room Temperacture |
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| HUANG Jia-mu,XU Cheng-jun,WANG Ya-ping. Deposition and Characterization of Magnetron Sputter (Ti, Zr)N Coatings on Room Temperacture[J]. Journal of Materials Science and Engineering, 2005, 23(5): 517-520 |
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| Authors: | HUANG Jia-mu XU Cheng-jun WANG Ya-ping |
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| Abstract: | The golden-like (Ti, Zr)N film, which has higher hardness and better corrosion resistance than TiN film, was deposited by reactive magnetron sputtering on slides and Al substrates. The crystalline phase, morphology and electronic structure were determined by XRD and STM. The result of XRD showed that the (Ti, Zr)N film was polycrystalline and consisted of mixed crystal of TiN and ZrN phases. STM images of the prepared films indicated that the surface of the films were smooth, dense and compact without large particles attached loosely. The STS spectra showed that doped (Ti, Zr)N didn't had the same energy level and band-gap as TiN, only tow new energy levels, Eg=0.33eV and Eg=0.42eV appeared, therefore the color of (Ti, Zr)N film remains golden-like. |
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| Keywords: | (Ti Zr)N film golden-like color surface morphology electronic structure polycrystalline film |
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