首页 | 本学科首页   官方微博 | 高级检索  
     

二氧化硫脲过还原抑制剂的研究
引用本文:孙韫五.二氧化硫脲过还原抑制剂的研究[J].苏州大学学报(工科版),1987(3).
作者姓名:孙韫五
作者单位:苏州丝绸工业院化学教研室
摘    要:本文着重研究了二氧化硫脲(Thiourea Dioxide)在还原蓝RSN等染料染色过程中过还原问题。根据实验结果,选定了TD还原电位抑制剂W—I,同时探清了染色过程中电位变化规律及抑制剂W—I,最佳性能数据。

关 键 词:过还原  二氧化硫脲  还原电位抑制剂  染色

A Study of the Reducing-over proof Resistance Agent of the Thiourea Dioxide
Sun Yun-Wu.A Study of the Reducing-over proof Resistance Agent of the Thiourea Dioxide[J].Journal of Suzhou University(Engineering Science Edition),1987(3).
Authors:Sun Yun-Wu
Abstract:This Paper deals with the problem of the reducing-over proof of the thi-ourea dioxide in the dyeing process of the vat blue RSN colour and others. Based on the experimental results, the reducing potential resistance agent W-1 of the thiourea dioxide was elected, and the regularity of the potential changes in the dyeing. Process and the optimum performance data of the resistance agent W-1 were found out.
Keywords:reducing-over proof thiourea diozide reducing potential resistance agent dyeing  
本文献已被 CNKI 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号