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Effects of ion implantation on the microstructure and residual stress of filter arc CrN films
Authors:Ko-Wei Weng  Sheng Han  Chih-Sheng Hsu  Da-Yung Wang
Affiliation:a Institute of Materials and System Engineering, Mingdao University, 369 Wen-Hua Road, Peetow, Changhua, Taiwan 523, ROC
b Department of Materials Engineering, National Chung Hsing University, 250 Kuo Kung Road, Taichung, Taiwan 402, ROC
c Department of Leisure and Recreation Management, National Taichung Institute of Technology, 129 San-min Road, Section 3, Taichung, Taiwan 404, ROC
Abstract:Chromium nitride coatings were deposited using a hybrid physical vapor deposition (PVD) system containing a filter arc deposition (FAD) and a metal plasma ion implantation source (MPII). Exactly how surface residual stress affects film characteristics is investigated using glancing incident X-ray diffraction (GIXRD) and pole figure analyses. Compared with unimplanted CrN, implanted carbon typically increases compressive residual stress and hardness. Wear resistance was also improved by implanted carbon.
Keywords:Hybrid PVD   Metal plasma ion implantation   Glancing incident X-ray diffraction   Wear resistance
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