Microstructures and magnetic properties of [SiO2/FePt]5/Ag thin films

SiO2/FePt]5/Ag thin films were deposited by RF magnetron sputtering on the glass substrates and post annealing at 550 ℃for 30 min in vacuum. Vibrating sample magnetometer and X-ray diffraction analyser were applied to study the magnetic properties and microstructures of the films. The results show that without Ag underlayer SiO2/FePt]5 films deposited onto the glass are FCC disordered; with the addition of Ag underlayer SiO2/FePt]5/Ag films are changed into L10 and (111) mixed texture. The variation of the SiO2 nonmagnetic layer thickness in SiO2/FePt]5/Ag films indicates that SiO2-doping plays an important role in improving the order parameter and the perpendicular magnetic anisotropy, and reducing the grain size and intergrain interactions. By controllingSiO2 thickness the highly perpendicular magnetic anisotropy can be obtained in the SiO2 (0. 6nm)/FePt (3 nm)]5/Ag (50 nm) films and highly (001)-oriented films can be obtained in the SiO2 (2 nm)/FePt (3 nm)]5/Ag (50 nm) films.