TEM observations of diamond films produced by hot filament thermal CVD |
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| Authors: | Y Ohsawa Y Tamou N Kikuchi K Hiraga T Oku |
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| Affiliation: | (1) Central Research Institute of Mitsubishi Metal Corporation, 1-297 Kitabukuro-cho, Omiya, 330 Saitama, Japan;(2) Institute for Materials Research, Tohoku University, Katahira, 980 Sendai, Japan |
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| Abstract: | Diamond films were provided by a hot filament thermal chemical vapour deposition method with an H2-CH4 gas mixture under various reaction conditions: CH4/H2 ratios of 0.5% and 1.0%, Si and Cu substrates, a substrate temperature of 750 °tC, a pressure of 7 torr and a reaction time of 12 h. TEM observation showed that the films produced have many defects such as twins, stacking faults and large distortion of lattices. These defects, which increase with increasing CH4 concentration, seem to be introduced during the crystal growth process. Fivefold symmetry twinned crystals were often observed in the diamond films. |
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