偏压对电弧离子镀CrNx薄膜结构和机械性能的影响

采用电弧离子镀技术在不锈钢基体表面制备了CrNx薄膜,并采用场发射扫描电镜、X射线衍射仪、显微硬度仪、球-盘式摩擦磨损试验机等手段对在不同偏压下沉积的CrNx薄膜的表面形貌、相结构、显微硬度和摩擦学性能进行考察.结果表明:随着偏压的增加, CrNx薄膜沉积率下降,厚度降低,CrNx薄膜表面颗粒逐渐变少,表面粗糙度降低,结晶度增大,晶粒尺寸增加;CrNx薄膜由Cr2N相和CrN相组成,薄膜的择优取向发生较大变化.当偏压为-100V时,CrNx薄膜的表面结构最致密,硬度最高,抗磨损性能最强.

The Influences of Bias on the Microstructure and Mecharucal Properties of CrNx Films Prepared by Cathodic Arc Evaporation

In the present study, CrNx films were deposited by using cathodic arc ion evaporation technique using stainless steel as subsrate. The surface morghology, the mechanical and tribological properties of CrNx films obtained under various biases were examined by various standard characterization techniques and equipments, such as field scanning electronic microscopy, X-ray diffraction, ball-on-disc friction tester, microindention system and so on. With the increase of the substrate bias, the number of macroparticles, the thickness and the deposition rate decrease, the surfaces of the films become smoother and smoother, the sizes of the crystalline grains increase, and the texture of the CrNx films changes significantly. The CrNx coatings with - 100V sample bias exhibits the densest surface structure, well development crystalline grain, apparent hardness enhancement and good wear resistance.