850 nm wavelength range nanoscale resonant optical filter fabrication using standard microelectronics techniques

The fabrication and characterization of a nanoscale resonant optical filter at wavelength around 850 nm is reported using standard C-MOS compatible microelectronics techniques. We discuss the different steps of the process and their impact on the final structure. We show that the use of these techniques gives an efficient filter on glass substrate with high transmission and a narrow bandwidth of 0.4 nm. We also demonstrate the same process on a silicon substrate for a potential integration with electronic functions.