Fabrication and magnetic force microscopy (MFM) observation of nano scale ferromagnetic nanodot arrays

A novel electron beam lithography technique was utilized to fabricate nano scale magnetic dots array with high periodicity. C₆₀ film (fullerine) was used as an electron beam sensitive resist for electron beam patterning carried out under a high accelerating voltage of 200 kV in a transmission electron microscope with a scanning mode. 50 nm sized permalloy (Py) nanodot arrays were successfully fabricated using the method followed by ion-milling. An array of Co nanodots having a size of 100×70 nm was alternatively prepared by liftoff instead of ion milling so as to prevent surface damage by ion milling. Lift-off does not yield any surface roughness, which is important for device fabrication. Magnetic force microscopy (MFM) observations were carried out on the fabricated Co nanodot arrays. A single domain state could be realized in patterned Co nanodots. MFM tip induced magnetization effects were also clearly demonstrated in the array of Co nanodots.