CMOS-SOI platform for monolithic integration of crystalline silicon MEMS |
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| Authors: | Villarroya M. Figueras E. Verd J. Teva J. Abadal G. Perez-Murano F. Montserrat J. Uranga A. Esteve J. Barniol N. |
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| Affiliation: | Dept. of Electron. Eng., Univ. Autonoma de Barcelona, Bellaterra, Spain; |
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| Abstract: | A new platform for the fabrication of crystalline micro- and nano-electromechanical systems fully integrable with CMOS is presented. A pre-CMOS process on SOI wafers allows bulk silicon areas for standard CMOS processing and areas with a stack layer of silicon and silicon oxide to be obtained, in which a set of microelectromechanical devices can be fabricated. An integrated resonant beam system with electrical actuation and detection fabricated according to the presented approach is provided. |
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