| 气动增压泵在单片晶圆清洗过程中的应用 |
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| 引用本文： | 杜建科,刘永进,冯小强. 气动增压泵在单片晶圆清洗过程中的应用[J]. 电子工业专用设备, 2011, 40(1): 18-20 |
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| 作者姓名： | 杜建科 刘永进 冯小强 |
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| 作者单位： | 中国电子科技集团公司第四十五研究所; |
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| 摘 要： | 主要分析了气动增压泵的组成和工作原理,描述了气动增压泵在单片晶圆清洗过程中的应用特点和优势.介绍了气动增压泵在应用过程中的控制方法和选用注意事项.
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| 关 键 词： | 气动增压泵 单片晶圆清洗 液泵流量 无级控制 |
The Pneumatic Booster Pump Apply to the Single Wafer Cleaning Process |
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| DU Jianke,LIU Yongjin,FENG Xiaoqiang. The Pneumatic Booster Pump Apply to the Single Wafer Cleaning Process[J]. Equipment for Electronic Products Marufacturing, 2011, 40(1): 18-20 |
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| Authors: | DU Jianke LIU Yongjin FENG Xiaoqiang |
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| Affiliation: | DU Jianke,LIU Yongjin,FENG Xiaoqiang (The 45th Research Institute of CETC,Beijing 101601,Chia) |
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| Abstract: | This article analyses the pneumatic booster pump's configuration and working principle,introduced its applying characteristic and advantage in the single wafer cleaning process.In addition,this article expounds the controlling and choosing ways and means when applying the pneumatic booster pump. |
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| Keywords: | the Pneumatic Booster Pump the Single Wafer Cleaning Pump liquid flux stepless control |
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